Inspectability of PSM masks for the 32nm node using STARlight2+HUANG, Chain-Ting; CHENG, Yung-Feng; KUO, Shih-Ming et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282P.1-70282P.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithographyLIN, Cheng-Ming; LOONG, Wen-An.Microelectronic engineering. 2001, Vol 57-58, pp 41-48, issn 0167-9317Conference Paper

Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelengthLAI, F. D; WANG, L. A.Microelectronic engineering. 2001, Vol 57-58, pp 439-445, issn 0167-9317Conference Paper

Aerial-image based inspection of AAPSM for 193nm lithography generationROSENBUSCH, Anja; HEMAR, Shirley; FALAH, Reuven et al.SPIE proceedings series. 2003, pp 375-382, isbn 0-8194-4996-2, 8 p.Conference Paper

Qualitative analysis of haze defectsCHOI, Jaehyuck; KOH, Soowan; SUNGHUN JI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63492S.1-63492S.9, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

A films based approach to intensity imbalance correction for 65 nm node c:PSMCOTTLE, Rand; SIXT, Pierre; LASSITER, Matt et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 59920J.1-59920J.9Conference Paper

A novel GDSII compression techniquePEREIRA, Mark; BARUAH, Barsha.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 2, 59923N.1-59923N.8Conference Paper

Integrating Cr and MoSi etch for optimal photomask critical dimension uniformity and phase uniformityWISTROM, Richard; KOMIZO, Toru; NEMOTO, Satoru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71220F.1-71220F.9, 2Conference Paper

Wavelength dependent spot defects on advanced embedded attenuated phase-shift masksMAGG, Christopher; BENZ, Jason; KINDT, Louis et al.SPIE proceedings series. 2004, pp 72-80, isbn 0-8194-5513-X, 2Vol, 9 p.Conference Paper

Super-resolution enhancement method with phase-shifting mask available for random patternsMISAKA, Akio; MATSUO, Takahiro; SASAGO, Masaru et al.Symposium on VLSI technology. 2002, pp 200-201, isbn 0-7803-7312-X, 2 p.Conference Paper

Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applicationsKALUS, Christian K; LIST, Steffen; ERDMANN, Andreas et al.Microelectronic engineering. 2001, Vol 57-58, pp 79-86, issn 0167-9317Conference Paper

On-mask CD and overlay test structures for alternating aperture phase shift lithographySMITH, Stewart; MCCALLUM, Martin; WALTON, Anthony J et al.IEEE transactions on semiconductor manufacturing. 2005, Vol 18, Num 2, pp 238-245, issn 0894-6507, 8 p.Conference Paper

Fast and efficient phase conflict detection and correction in standard-cell layoutsCHIANG, C; KAHNG, A. B; SINHA, S et al.IEEE/ACM International Conference on Computer-Aided Design. 2005, pp 149-156, isbn 0-7803-9254-X, 1Vol, 8 p.Conference Paper

Approaching zero etch bias at Cr etch processNESLADEK, Pavel; FALK, Norbert; WISWESSER, Andreas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 59920n.1-59920N.9Conference Paper

Chromeless phase lithography reticle defect inspection challenges and solutionsZURBRICK, Larry; VACCA, Anthony; REESE, Bryan et al.SPIE proceedings series. 2004, pp 54-63, isbn 0-8194-5513-X, 2Vol, 10 p.Conference Paper

Phase-defocus windows for alternating phase shifting maskLIANG, Fu-Jye; CHEN, Chun-Kuang; SHIN, Jaw-Jung et al.SPIE proceedings series. 2004, pp 406-415, isbn 0-8194-5513-X, 2Vol, 10 p.Conference Paper

Hidden CD errors due to reticle imperfectionMA, Z. Mark; ZHENG, Sandra.SPIE proceedings series. 2001, pp 888-897, isbn 0-8194-4032-9, 2VolConference Paper

A study of obscuration in catadioptric lensesMCCALLUM, Martin; SMITH, Bruce; BASSETT, Steve et al.SPIE proceedings series. 2001, pp 1128-1136, isbn 0-8194-4032-9, 2VolConference Paper

¹How to match without copying - An approach for APSM mask process matching using aerial imagingSCZYRBA, M; ROMEO, C; SCHURACK, F et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78231Z.1-78231Z.11, 2Conference Paper

Advance hybrid mask process developmentLIN, Orson; CHOU, Jomarch; FU, K. K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 2, 62831S.1-62831S.6Conference Paper

Process window enhancement for 45 nm node using alterable transmission phase shifting materialsBECKER, Hans; RENNO, Markus; ZEISS, Carl et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63490J.1-63490J.10, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

The effect between mask blank flatness and wafer print process window in ArF 6% Att. PSM maskTZENG, Joseph; LEE, Booky; LU, Jerry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 634954.1-634954.6, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Optical DC overlay measurement in the 2nd level process of 65 nm Alternating Phase Shift MaskJIAN MA; KE HAN; CHANDRAMOULI, Mahesh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 59921P.1-59921O.10Conference Paper

A new approach for eliminating unwanted patterns in attenuated phase shift masksMUKHERJEE-ROY, M; SINGH, N; MEHTA, S. S et al.Microelectronics journal. 2003, Vol 34, Num 10, pp 965-967, issn 0959-8324, 3 p.Article

Investigation of phase shift mask distortion effectJINGLEI DU; ZHENG CUI; XIAOCONG YUAN et al.Microelectronic engineering. 2002, Vol 61-62, pp 265-270, issn 0167-9317Conference Paper